Record #00365Technology archive
First Commercial High-NA EUV Lithography Installation
Intel completed the industry's first commercial high-NA EUV lithography installation at its Hillsboro, Oregon research site in 2024.
ARCHIVE VISUAL / 01
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Achievement date
2024
2024-04
- Location
- Intel Fab D1X, Hillsboro, Oregon, USA · Oregon · United States
- Record status
- VerifiedView verification details ↗Report an issue
Overview
Archive NoteASML's TWINSCAN EXE:5000 uses 0.55 numerical aperture, compared with 0.33 for the previous EUV platform.
Intel reported installation and calibration in April 2024; ASML reaffirmed the industry's first installation in September 2026.
Record history
1 Milestones- First achievementIntel's first commercial High-NA EUV systemIntel Fab D1X, Hillsboro, Oregon, USAFirst achievement
Sources
Evidence & ReferencesVerification basis and limitations
VerifiedThe record conclusion has sufficient verification support.
Basis: direct confirmation by an authority
Intel and ASML confirm the first commercial High-NA EUV installation in 2024.
- Verification assessment
- 2026-11-05
- Last editorial review
- 2026-11-05
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